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AMAT Ceramic Ring Floating Skirt
AMAT 0200-09721 Ceramic Ring Floating Skirt
AMAT Ceramic Ring Floating Skirt
AMAT 0200-09721 Ceramic Ring Floating Skirt

0200-09721 Seramik Halka Yüzer Etek


Semixlab specializes in high-performance semiconductor ceramic components designed for harsh plasma and thermal handling environments. Our AMAT 0200-09721 ceramic ring floating skirt is designed to provide Applied Materials (AMAT) semiconductor device systems with superior thermal stability, plasma resistance, and contamination control. We look forward to your inquiry.

Açıklama

The AMAT 0200-09721 Ceramic Ring Floating Skirt is a precision ceramic chamber component commonly used in AMAT semiconductor processing systems. Engineered for high-temperature and plasma-intensive environments, the component provides exceptional:

● Thermal resistance

● Electrical insulation

● Plasma erosion resistance

● Kimyasal kararlılık

● Düşük parçacık oluşumu

Semixlab focuses on high-purity ceramic manufacturing technologies to ensure consistent quality, tight tolerances, and excellent compatibility with semiconductor process requirements.

Roles in AMAT Systems

In AMAT semiconductor equipment, the Ceramic Ring Floating Skirt functions as a critical chamber protection and process stabilization component.

Başlıca görevleri şunlardır:

Plasma Boundary Control

The ceramic ring helps maintain stable plasma distribution inside the process chamber, contributing to improved process uniformity across the wafer surface.

Oda Koruması

It acts as a protective barrier between aggressive plasma chemistries and sensitive chamber structures, reducing chamber wear and extending maintenance intervals.

Elektriksel İzolasyon

The floating skirt structure provides electrical insulation between chamber components, helping stabilize RF plasma behavior during deposition or etching processes.

Thermal Stability Support

Under high-temperature processing conditions, the ceramic ring maintains structural integrity and dimensional stability, ensuring consistent process performance.

Yarı İletken İşlemlerinde Tipik Uygulamalar

The AMAT 0200-09721 Ceramic Ring Floating Skirt is widely used in advanced semiconductor fabrication processes, including:

1. PECVD (Plasma Enhanced Chemical Vapor Deposition)

Supports stable plasma conditions and minimizes contamination during dielectric film deposition.

2. Plazma Aşındırma

Provides plasma resistance and chamber protection in fluorine- and chlorine-based etching environments.

3. PVD (Physical Vapor Deposition)

Helps maintain clean chamber conditions and improves process repeatability.

4. High-Temperature Semiconductor Processing

Performs reliably in thermal cycling environments requiring excellent heat resistance and low particle generation.

5. Advanced Logic & Memory Manufacturing

Suitable for process environments with strict contamination and uniformity requirements.

Neden Semixlab'ı Seçmelisiniz?

At Semixlab, we combine advanced ceramic material expertise with semiconductor process understanding to deliver reliable chamber components for global semiconductor customers.

Biz sağlıyoruz:

● Precision ceramic machining

● High-purity material solutions

● Semiconductor-grade quality control

● Customized OEM/ODM support

● Stable supply capability

Semixlab is committed to supporting next-generation semiconductor manufacturing with reliable, high-performance material solutions.

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